Quartz substrate for semiconductor lithography
End face grinding, bevel grinding, and other round polishing support! Compatible with 6 inches.
In the semiconductor lithography industry, high-precision pattern transfer is required. In particular, the quality of quartz substrates during the exposure process significantly affects device performance. Distortion and surface unevenness of the substrates can reduce pattern accuracy and lead to lower yields. Our quartz substrates are compatible with notch processing and olifura processing, and can also accommodate edge polishing and bevel polishing, enabling high-precision lithography processes. 【Usage Scenarios】 - Mask substrates in the lithography process - Wafer manufacturing processes - Various optical components 【Benefits of Implementation】 - Achievement of high-precision pattern transfer - Contribution to yield improvement - Adaptability to diverse processing needs
- Company：ブル精密 (株)ブル精密 本社
- Price：Other
